Skip to main content

VIEW LARGER COVER

In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable.

Database Needs for Modeling and Simulation of Plasma Processing identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.

Suggested Citation

National Research Council. 1996. Database Needs for Modeling and Simulation of Plasma Processing. Washington, DC: The National Academies Press. https://doi.org/10.17226/5434.

Import this citation to:

Publication Info

74 pages |  8.5 x 11 | 

ISBNs: 
  • Paperback:  978-0-309-05591-8
  • Ebook:  978-0-309-17513-5
DOI: https://doi.org/10.17226/5434
Chapters skim
Front Matter i-x
FINDINGS 1-1
CONCLUSIONS 2-2
RECOMMENDATIONS 3-3
REFERENCES 4-4
PLASMA PROCESSING FOR SEMICONDUCTOR MANUFACTURING 5-7
PLASMA EQUIPMENT SUPPLIER PERSPECTIVES 8-8
CHIP MANUFACTURER PERSPECTIVES 9-10
RECOMMENDED PRIORITIES FOR DEVELOPMENT OF AN IMPROVED DATABASE 11-11
REFERENCES 12-12
TOOL SCALE MODELS 13-14
Barriers to Using Tool Scale Models 15-15
FEATURE SCALE MODELS 16-16
GENERAL ASSESSMENT OF MODELING STATE OF THE ART AND VISION OF FUTURE CAPABILITY AND IMPLIED NEEDS 17-20
REFERENCES 21-22
TECHNIQUES FOR MEASUREMENTS OF GAS PHASE SPECIES 23-23
Information Resources 24-24
Roles of the Database In Motivating Diagnostic Experiments 25-25
SURFACE REACTION DATABASE AND DIAGNOSTICS 26-26
New Diagnostic Techniques 27-27
FINDINGS 28-28
REFERENCES 29-32
STATE OF THE DATABASE 33-33
Incident Flux and Desorbing Flux Analysis 34-34
Condition of the Surface 35-35
Particle Beams 36-36
Substrate Temperature Dependence 37-37
FINDINGS 38-38
REFERENCES 39-40
Molecules 41-41
Neutral Dissociation 42-42
MOMENTUM TRANSFER, SWARM, AND DISCHARGE MEASUREMENTS 43-43
GENERAL COMMENTS 44-44
REFERENCES 45-46
INTRODUCTION 47-47
Ion-Molecule and Charge Exchange Reactions 48-49
Ion-Ion Neutralization 50-50
Neutral Chemistry 51-51
Status of the Database 52-52
Excited State Chemistry and Penning Ionization 53-53
Summary 54-54
THERMOCHEMICAL DATA 55-56
REFERENCES 57-58
Appendix A: Acronyms and Abbreviations 59-60
Appendix B: Workshop Agenda 61-62
Appendix C: Workshop Participants 63-64

What is skim?

The Chapter Skim search tool presents what we've algorithmically identified as the most significant single chunk of text within every page in the chapter. You may select key terms to highlight them within pages of each chapter.

Copyright Information

The National Academies Press (NAP) has partnered with Copyright Clearance Center's Marketplace service to offer you a variety of options for reusing NAP content. Through Marketplace, you may request permission to reprint NAP content in another publication, course pack, secure website, or other media. Marketplace allows you to instantly obtain permission, pay related fees, and print a license directly from the NAP website. The complete terms and conditions of your reuse license can be found in the license agreement that will be made available to you during the online order process. To request permission through Marketplace you are required to create an account by filling out a simple online form. The following list describes license reuses offered by the NAP through Marketplace:

  • Republish text, tables, figures, or images in print
  • Post on a secure Intranet/Extranet website
  • Use in a PowerPoint Presentation
  • Distribute via CD-ROM
  • Photocopy

Click here to obtain permission for the above reuses. If you have questions or comments concerning the Marketplace service, please contact:

Marketplace Support
International +1.978.646.2600
US Toll Free +1.855.239.3415
E-mail: support@copyright.com
marketplace.copyright.com

To request permission to distribute a PDF, please contact our Customer Service Department at customer_service@nap.edu.

loading iconLoading stats for Database Needs for Modeling and Simulation of Plasma Processing...