FIGURE 2-1 Integrated circuit growth. SOURCE: Adapted from Intel. 2002. Moore’s Law. Available online at <http://www.intel.com/research/silicon/mooreslaw.htm> [May 31, 2002].
FIGURE 2-2 Lithography half-pitch feature size versus time. SOURCE: Adapted from the International Technology Roadmap for Semiconductors, 2001 edition. Austin, Tex.: International SEMATECH.
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2. Expectations for Future Micro- and Nanotechnologies ."
Implications of Emerging Micro and Nanotechnology . Washington, DC: The National Academies Press,
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