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PAPERBACK list:$23.00 Web:$20.70 add to cart PDF BOOK your price: $18.00 add to cart Rights & Permissions Free Resources Display this book on your site! Related Titles Plasma Science: Advancing Knowledge in the National Interest Condensed-Matter and Materials Physics: The Science of the World Around Us Other Related Titles Plasma Processing of Materials: Scientific Opportunities and Technological Challenges (1991) Commission on Physical Sciences, Mathematics, and Applications (CPSMA) Web Search Builder Use this book's key terms to search within this book, across our collection, or across the Web. Skim This Chapter Skim this chapter and use this chapter's key terms to search within this book. Reference Finder Paste in your own text to find books that relate to your topic. Page 75   E-mail  Facebook  Digg  Stumble  Twitter More The following HTML text is provided to enhance online readability. Many aspects of typography translate only awkwardly to HTML. Please use the page image as the authoritative form to ensure accuracy. Appendix Participants in Workshop on Plasma Processing of Materials J. Norman Bardsley, Lawrence Livermore National Laboratory Kurt Becker, The City College of New York David Benenson, State University of New York at Buffalo Richard Buss, Sandia National Laboratories Hugh Casey, Los Alamos National Laboratory Philip Cosby, SRI International Thomas Eddy, EG&G Idaho, Inc., INEL Douglas W. Ernie, University of Minnesota David Fraser, Intel Valery Godyak, GTE Laboratories Inc. John Herron, National Institute of Standards and Technology Dale Ibbotson, AT&T Bell Laboratories Peter Kong, EG&G Idaho, Inc., INEL Charles Kruger, Jr., Stanford University Vincent McCoy, California Institute of Technology Bob McGrath, Sandia National Laboratories P. A. Miller, Sandia National Laboratories John Mucha, AT&T Bell Laboratories Jerry Perrizo, Air Force Office of Scientific Research Charles W. Roberson, Office of Naval Research James Roberts, National Institute of Standards and Technology Leon Shohet, University of Wisconsin Mark Smith, Sandia National Laboratories Iran Thomas, Department of Energy Amy Wendt, University of Wisconsin Claude Woods, University of Wisconsin Page 75 FRONT MATTER (R1-R12) 1 SUMMARY, FINDINGS, CONCLUSIONS, AND RECOMMENDATIONS (1-5) 2 PLASMA PROCESSING AND LOW-ENERGY PLASMA SCIENCE (6-12) 3 PLASMA PROCESSING IN THE ELECTRONICS INDUSTRY (13-36) 4 SCIENTIFIC FOUNDATION OF PLASMA PROCESSING (37-64) 5 EDUCATIONAL ISSUES (65-74) APPENDIX: PARTICIPANTS IN WORKSHOP ON PLASMA PROCESSING OF MATERIALS (75-76)

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OCR for page 75
Plasma Processing of Materials: Scientific Opportunities and Technological Challenges Appendix Participants in Workshop on Plasma Processing of Materials J. Norman Bardsley, Lawrence Livermore National Laboratory Kurt Becker, The City College of New York David Benenson, State University of New York at Buffalo Richard Buss, Sandia National Laboratories Hugh Casey, Los Alamos National Laboratory Philip Cosby, SRI International Thomas Eddy, EG&G Idaho, Inc., INEL Douglas W. Ernie, University of Minnesota David Fraser, Intel Valery Godyak, GTE Laboratories Inc. John Herron, National Institute of Standards and Technology Dale Ibbotson, AT&T Bell Laboratories Peter Kong, EG&G Idaho, Inc., INEL Charles Kruger, Jr., Stanford University Vincent McCoy, California Institute of Technology Bob McGrath, Sandia National Laboratories P. A. Miller, Sandia National Laboratories John Mucha, AT&T Bell Laboratories Jerry Perrizo, Air Force Office of Scientific Research Charles W. Roberson, Office of Naval Research James Roberts, National Institute of Standards and Technology Leon Shohet, University of Wisconsin Mark Smith, Sandia National Laboratories Iran Thomas, Department of Energy Amy Wendt, University of Wisconsin Claude Woods, University of Wisconsin

OCR for page 76
Plasma Processing of Materials: Scientific Opportunities and Technological Challenges This page in the original is blank.

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bell laboratories