Appendix A:
Acronyms and Abbreviations


AFM

atomic force microscopy


BEOL

back end of the line


CARS

coherent anti-Stokes Raman scattering

CD

critical dimension

CFM

contamination-free manufacturing

CMOS

complementary metal oxide semiconductor

CVD

chemical vapor deposition


DFWM

degenerate four-wave mixing

DRAM

dynamic random access memory


ECR

electron cyclotron resonance

E/N

ratio of electric field to gas density


FOM

Fundamenteel Onderzoek der Materie (a research institute in the Netherlands)

FTIR

Fourier transform infrared

FTMS

Fourier transform mass spectroscopy


IC

integrated circuit

ICP

inductively coupled plasma

IR

infrared

IRIS

imaging of radicals interacting with surfaces


JANAF

Joint Army-Navy-Air Force


Kn

Knudsen number


LIF

laser-induced fluorescence


MD

molecular dynamics

MOSFET

metal oxide semiconductor field effect transistor

MPU

microprocessor unit


NIST

National Institute of Standards and Technology


PECVD

plasma-enhanced chemical vapor deposition

PVD

physical vapor deposition


rf

radio frequency

RIE

reactive ion etching


SEM

scanning electron microscopy

SEP

stimulated emission pumping

SIA

Semiconductor Industry Association

SPIE

The International Society for Optical Engineering


TALIF

two-photon allowed laser-induced fluorescence

TEM

transmission electron microscopy

TEOS

tetraethoxysilane


UHV

ultrahigh vacuum

ULSI

ultralarge-scale integration

UV

ultraviolet


VLSI

very large scale integration



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--> Appendix A: Acronyms and Abbreviations AFM atomic force microscopy BEOL back end of the line CARS coherent anti-Stokes Raman scattering CD critical dimension CFM contamination-free manufacturing CMOS complementary metal oxide semiconductor CVD chemical vapor deposition DFWM degenerate four-wave mixing DRAM dynamic random access memory ECR electron cyclotron resonance E/N ratio of electric field to gas density FOM Fundamenteel Onderzoek der Materie (a research institute in the Netherlands) FTIR Fourier transform infrared FTMS Fourier transform mass spectroscopy IC integrated circuit ICP inductively coupled plasma IR infrared IRIS imaging of radicals interacting with surfaces JANAF Joint Army-Navy-Air Force Kn Knudsen number LIF laser-induced fluorescence MD molecular dynamics MOSFET metal oxide semiconductor field effect transistor MPU microprocessor unit NIST National Institute of Standards and Technology PECVD plasma-enhanced chemical vapor deposition PVD physical vapor deposition rf radio frequency RIE reactive ion etching SEM scanning electron microscopy SEP stimulated emission pumping SIA Semiconductor Industry Association SPIE The International Society for Optical Engineering TALIF two-photon allowed laser-induced fluorescence TEM transmission electron microscopy TEOS tetraethoxysilane UHV ultrahigh vacuum ULSI ultralarge-scale integration UV ultraviolet VLSI very large scale integration

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