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PAPERBACK list:$26.00 Web:$23.40 add to cart Rights & Permissions Free PDF Access Free Resources Sign in to download PDF book and chapters PDF EXECUTIVE SUMMARY Display this book on your site! Related Titles Plasma Science: Advancing Knowledge in the National Interest Visualizing Chemistry: The Progress and Promise of Advanced Chemical Imaging Other Related Titles Database Needs for Modeling and Simulation of Plasma Processing (1996) Commission on Physical Sciences, Mathematics, and Applications (CPSMA) Web Search Builder Use this book's key terms to search within this book, across our collection, or across the Web. Skim This Chapter Skim this chapter and use this chapter's key terms to search within this book. Reference Finder Paste in your own text to find books that relate to your topic. Page 61   E-mail  Facebook  Digg  Stumble  Twitter More The following HTML text is provided to enhance online readability. Many aspects of typography translate only awkwardly to HTML. Please use the page image as the authoritative form to ensure accuracy. Appendix B: Workshop Agenda Saturday, April 1, 1995 0900 Opening Remarks David B. Graves and Mark J. Kushner, Co-chairs 0910 ARPA Objectives Bert Hui, Defense Advanced Research Projects Agency Session I: Industrial Perspectives A. Equipment Supplier Perspectives 0925 Modeling: A Design Engine For The U.S. Semiconductor Equipment Industry Alexander M. Voshchenkov, Lain Research Corporation 1005 Challenges in Design and Manufacturing of Semiconductor Process Equipment Abe Ghanbari, Materials Research Corporation 1045 Break   B. Chip Manufacturer Perspectives 1100 Plasma Processes—A Chipmaker's View Frederick Dill, IBM T.J. Watson Research Center 1140 Digital Semiconductor's Perspective on Plasma Modeling and Database Needs Andrew Labun, Digital Equipment Corporation 1215 Lunch   Session II: Status And Needs Of Modeling And Simulation A. Tool Scale Simulation 1315 Glow Discharge Plasma Simulation: Current Status, Needs, and Future Outlook Demetre J. Economou, University of Houston 1345 Development of Design Oriented Simulation Tools for the Microelectronic Industry Anantha Krishnan, CFD Research Corporation B. Feature Scale Simulation 1415 Low Pressure Transport and Reaction in Features Timothy S. Cale, Arizona State University 1445 Feature Scale Simulation and Model Characterization Vivek Singh, Intel Corporation 1515 Break   Session III: Discussion 1530 Breakout Sessions Industrial Perspectives Tool Scale Feature Scale   1630 Break   1645 Reports on Breakout Sessions   1645 Industrial Perspectives Andrew Labun Page 61 Front Matter (R1-R10) Executive Summary (1-4) 1 Industrial Perspectives (5-12) 2 Tool Scale and Feature Scale Models (13-22) 3 Radiative Processes and Diagnostics (23-32) 4 Heterogeneous Processes (33-40) 5 Electron Collision Processes (41-46) 6 Ion Processes, Neutral Chemistry, and Thermochemical Data (47-58) Appendix A: Acronyms and Abbreviations (59-60) Appendix B: Workshop Agenda (61-62) Appendix C: Workshop Participants (63-64)

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--> Appendix B: Workshop Agenda Saturday, April 1, 1995 0900 Opening Remarks David B. Graves and Mark J. Kushner, Co-chairs 0910 ARPA Objectives Bert Hui, Defense Advanced Research Projects Agency Session I: Industrial Perspectives A. Equipment Supplier Perspectives 0925 Modeling: A Design Engine For The U.S. Semiconductor Equipment Industry Alexander M. Voshchenkov, Lain Research Corporation 1005 Challenges in Design and Manufacturing of Semiconductor Process Equipment Abe Ghanbari, Materials Research Corporation 1045 Break   B. Chip Manufacturer Perspectives 1100 Plasma Processes—A Chipmaker's View Frederick Dill, IBM T.J. Watson Research Center 1140 Digital Semiconductor's Perspective on Plasma Modeling and Database Needs Andrew Labun, Digital Equipment Corporation 1215 Lunch   Session II: Status And Needs Of Modeling And Simulation A. Tool Scale Simulation 1315 Glow Discharge Plasma Simulation: Current Status, Needs, and Future Outlook Demetre J. Economou, University of Houston 1345 Development of Design Oriented Simulation Tools for the Microelectronic Industry Anantha Krishnan, CFD Research Corporation B. Feature Scale Simulation 1415 Low Pressure Transport and Reaction in Features Timothy S. Cale, Arizona State University 1445 Feature Scale Simulation and Model Characterization Vivek Singh, Intel Corporation 1515 Break   Session III: Discussion 1530 Breakout Sessions Industrial Perspectives Tool Scale Feature Scale   1630 Break   1645 Reports on Breakout Sessions   1645 Industrial Perspectives Andrew Labun

OCR for page 62
--> 1705 Tool Scale Demetre Economou 1725 Feature Scale Vivek Singh 1745 Summary Discussion David Graves and Mark Kushner 1915 Dinner   Sunday, April, 2, 1995 Session IV: Database Needs 0900 Introductory Remarks David B. Graves and Mark J. Kushner, Co-chairs 0900 Database Needs: Electron Impact Processes Jean W. Gallagher, National Institute of Standards and Technology 0930 Rate Constants of Heterogeneous Processes in Plasma-Assisted Processing Gottlieb S. Oehrlein, SUNY Albany 1000 Status of Ion and Neutral Chemistry Databases Mark J. Kushner, University of Illinois at Urbana-Champaign 1030 Break   1045 Thermodynamic and Excited State Data for Plasma Processing Arthur V. Phelps, JILA 1115 Data Needs for Radiative Processes and Diagnostics Alan Garscadden, Air Force Wright Laboratory 1145 Critical Evaluation and Dissemination of Plasma Databases W. Lowell Morgan, Kinema Research and Software 1215 Lunch   Session V: Discussion 1315 Breakout Sessions Electron Impact Processes Heterogeneous Processes Ion Impact Processes and Neutral Chemistry Thermochemistry of Reactive Species Radiative Processes and Diagnostics   1445 Break   1500 Reports on Breakout Sessions   1500 Electron Impact Processes Jean Gallagher 1520 Heterogeneous Processes Gottlieb Oehrlein 1540 Ion Impact Processes and Neutral Chemistry Mark Kushner 1600 Thermochemistry of Reactive Species Arthur Phelps 1620 Radiative Processes and Diagnostics Alan Garscadden 1640 Summary Discussion David Graves and Mark Kushner 1800 Adjourn  

Representative terms from entire chapter:

impact processes